A dual-mode electron beam lithography machine comprises an electron beam column for generating an electron beam for writing a pattern on a surface of a substrate 14) by way of a writing current, the substrate being supported on a stage movable to displace the substrate relative to the beam. Thus, there is an output that is personalized and unique to each user of the system. The method can further include controlling the object based on the determined deviation in orientation. When the three cylinders are in a print position, a connecting plane through the axis of rotation of the forme cylinder and the pivoting axis of the lever forms an angle of between 25\xb0 and 65\xb0 with a plane through the axis of rotation of the cylinder forming the printing point. Modifications made to the component within the editing frame are saved and the hosting file is displayed. The subsequent migration of cells from these tissues into the lesion or wound, followed by deposition of the appropriate extracellular matrix, results in closure of the lesion or fusion of a tissue gap.