A dry etching method involves plasma etching an organic anti-reflecting coating film through a mask layer made of photoresist and having a predetermined pattern by using an etching gas of CF4 and O2. The path of the web through the cassette is such that a region thereof for receiving spat ink from the print head is arranged downstream of a region thereof for wiping ink from the print head. Each of the first and second sections has a body portion and an end wall. Cross-communication between subsystems is managed by the central processor. The present invention more specifically discloses a method for cleaning an article which is susceptible to scratching, scuffing andor abrasion which comprises rubbing the surface of the article with a non-abrasive fabric which is comprised of a multitude of non-woven polyester fibers which are bound together in the form of a sheet with an ethylene-vinyl chloride copolymer binder.