A plasma process reactor is disclosed that allows for greater control in varying the functional temperature range for enhancing semiconductor processing and reactor cleaning. The conductive paste composition for an internal electrode includes a binder, a solvent, and metal powder for an internal electrode, including a nickel particle coated with a nickel nitride. The fin stock is passed through a series of forming dies to form or draw a plurality of tube receiving collared holes in the fin stock, followed by slitting or cutting the fin stock longitudinally to form a plurality of fin strips. The eluted DNA is suitable for numerous downstream applications. A flow passage between said flash chamber and the flow chamber for conveying a flashed gas from the flash chamber to the flow chamber; wherein the flashed gas conveyed from the flash chamber and the fluid received from the inlet of the outer housing mix along the fluid flow path toward the outlet of the outer housing.