A chamber-cleaning gas and an etching gas used for a silicon-containing film according to the present invention comprise a perfluoro cyclic ether having 2 to 4 carbon atoms which are ether-linked with carbon atoms. The pressure relief device includes an over-pressure relief area with a plurality of co-linear spaced apart recesses located thereon. In a case where a customer has carried the camera to a photo lab, image data is read out of the memory card or is acquired by reading the developed film, by an image data acquisition component. The checklist for each Product Category corresponds to portions of the Order Form, making it easier for the customer to enter accurate information regarding product and design decisions into the Order form. In one implementation, the energy source monitoring system detects when voltages in the energy source have fallen below a cutoff level, yet allows the device to continue running until the operator finishes the current device operation.