A mechanism modifies a deployment descriptor of each application component including at least one producer application component or consumer application component, by adding, for each producer application component or consumer application component, an application component identifier, a producer or consumer type, and a recipient identifier of a recipient the application component uses. The antenna traces may then be electroplated. Furthermore, proportional magnetic flux and proportional magnetic current is determined from the acquired current waveform data and the voltage waveform data proximate determined edge regions of the waveform data. Temperature compensating means sets temperature compensation values in such a way that a polishing rate is approximately uniform over a whole polishing surface of a polishing film. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.