A strained semiconductor material may be positioned in close proximity to the channel region of a transistor, such as an SOI transistor, while reducing or avoiding undue relaxation effects of metal silicides and extension implantations, thereby providing enhanced efficiency for the strain generation. The pipe consists of an inner tube that has an open end and a closed end with an intake disposed there between that communicates with the open end. The film holders with the films are sequentially processed in a sequential process. The unified image of biometric data can be constructed using the one or more portions of the at least one image of biometric data. Finally, the invention relates to methods of using the paper substrate.