A mask is configured for projecting a structure pattern onto a semiconductor substrate in an exposure unit. In the delivered state, the accommodating region of the discharging device is sufficiently large to ensure that the pump-type dispenser can be accommodated by the accommodating region when the dispenser has not yet been actuated and does not yet communicate with the outlet passageway. The semiconductor device includes an oxide semiconductor layer including a channel formation region, and a source and drain regions which are provided so that the channel formation region is interposed therebetween and have lower resistance than the channel formation region. The embodiment includes a flexible septum coupled to the body and covering the first recess, the flexible septum having an opening sized for passage of the driver. Therefore, the present invention includes a hydraulic pulse generator for slowing movement of the valve member which includes the direction of a hydraulic pulse toward the valve member as the valve member moves from its open position to its closed position.