The invention concerns a process for forming an optical component comprising:a\u2014formation of a multi-layer stack with an adjustment layer made of a metal-semiconductor mix formed in or on the stack,b\u2014etching a part of the multi-layer stack, including at least a part of the adjustment layer,c\u2014an annealing step to contract the adjustment layer within less than 1 nm. The apparatus is provided with an end time detecting section and a maximum reception end time is detected by detecting section based on reception signals on the receiver modules. Upon receiving a request for communication over a second communication system type, at least one of the first and second radio resources are re-configured for communication over the second communication system type. Additionally, the actuators may also serve to keep the mask flat and in the correct planar orientation.