A problem posed by the present invention relates to the modification of an existing company directory in a computer system during the securing of said system. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. 1 to 20%, which is accessible by co-spray drying the individual components and which is suitable for controlling the flowability of aqueous chemical construction suspensions is claimed. The silicon element has limited freedom of movement within the recess. According to additional embodiments, an apparatus for obtaining thermal data includes a thermal detector adapted to sense thermal characteristics of an environment using a plurality of pixels.