An HVLP spray system and toolbox design offers a fully integrated system that is durable on the jobsite, has internal storage for all basic tools needed to do the job and offers integrated user features specific to the application. The cleaning apparatus to separate contaminations from a wafer includes a housing receiving an oscillator therein, and a rod coupled to a surface of the oscillator to transmit ultrasonic waves produced from the oscillator to a cleaning solution applied onto an upper surface of the wafer. The monoalkyl quat is necessary in a ratio to the dialkyl quat of about not less than 2:1.