A pair of reflective masks is provided in a photolithography process, wherein pattern forming elements are divided into respective directions relative to a projection vector of an EUV ray, so that each of the reflective masks has the same pattern forming elements extending in one direction. The invention includes a master segment that preferably is round or oval in shape and easily griped by a user. The antenna array further comprises circuitry coupled to the antenna groups to select and activate certain antennas in a group to enable the antenna array to operate in either a beam formingsteering mode, a diversity mode or a MIMO mode or any combination thereof. The method of the present invention may further include a serial communications medium and the use of a serial test protocol for communicating the global variables to the BIST interface and test results from the interface. Each of the fully-functional engine and hybrid transmission may be tested separately from the other. To ensure economical production of the support and guide device and to reduce the number of components required, the guide device is integrated in the holder of the support device.