An illumination system for illuminating a mask in a microlithographic projection exposure apparatus includes an array of mirrors or other beam deflecting elements. The thermal cut-off circuit includes a thermal cut-off switch and an ambient thermal switch. Then, if the block exhibits a sufficient absorption performance, then one of more optical components such as one or more prisms, etalons, andor windows, etc. In the event the addresses relate to pages in different blocks, then previously latched page addresses are reset. The method executes the test item generated and verifying the propriety of the policy according to the result of the system management operations executed by the policy. The dispenser further includes a third member secured to the first member by a hinge that is coaxially aligned with the first hinge.