1460869919-bc56e88a-2079-4ef3-900d-13cc90d4427c

A photonic semiconductor device and method are provided that ensure that the surface of the device upon completion of the SAG process is planar, or at least substantially planar, such that performance of the subsequent processes is facilitated, thereby enabling higher manufacturing yield to be achieved. The maintenance station comprises a capper sealingly engageable around the printhead. The terminal comprises a determination unit for determining in which communication network the terminal is located.