Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The method includes obtaining biometric data. The first set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a first volume between the bottom electrode and the top electrode. The image data from the depth camera is parsed to determine how the controller is manipulated, and a corresponding manipulation of the cursor is performed in virtual space.