A photolithography mask is based on a combination of a half-tone phase mask and an alternating phase mask such that, when the radiation passes through some of the openings, a phase difference is in each case produced between adjacent openings, and the surroundings of the openings are partially transparent and shift the phase of the radiation. In one embodiment, data anticipated to be soon to be requested by patrons of a particular business establishment can be pre-loaded to a local server provided at the particular business establishment. The receiving groove is configured to guide the support ring as it expands to minimize bending and distortion.