The present invention relates to a semiconductor memory device and a method for fabricating the same. The aromatic production apparatus can include a first fractionation zone, a second fractionation zone, and a third fractionation zone. The image data processing apparatus includes a display control unit to display, on the display device, a preview image reflecting the process content based on the associated process content. The decorative pattern is formed on the first surface. The method for polishing a surface of a semiconductor device wafer comprises first polishing a surface of the semiconductor wafer by a first fixed abrasive polishing method; and finish polishing the polished surface of the semiconductor wafer by a second fixed abrasive polishing method different from the first fixed abrasive polishing method.