A method for fabricating a semiconductor device is provided. The method includes receiving principal funds from one or more investing entities and receiving data describing an obligation of an endowed institution to pay for goods or services from a supplying entity. The axial flow fan draws air through the radiator long the longitudinal axis. The nitrogen-rich native oxide layer restores the moisture and the reflectivity of the surface of the wafer to a predetermined range before performing the photoresist reworking process.