The method manufactures sputter target assemblies. A first control means generates a first state of a control signal in the presence of a clock signal in a first mode of operation. The method involves monitoring the etching of the features, generating data related to the features, and relaying the data to a control system to optimize the EUV mask fabrication process. The point of application of the force, the magnitude of the force, and the viscosity of the adhesive are selected such that minimal optical fiber bending occurs, thereby assuring that the optical fiber is positioned at the desired position in the passageway for an appreciable distance from the ferrule end face along the passageway.