A process for removal of ethylene oxide from ambient air laden with EO is passed through a zeolite-based removal media, which preferrably consists of the acid form of zeolite ZSM-5, herein referred to as \u201cH-ZSM-5. The semiconductor substrate might comprise a group III-V compound semiconductor. The composition may be applied using an applicator to selectively apply the composition to targeted areas within an oral cavity.