A damage locating system also provides thermal protection. The exposure apparatus supplies the liquid to a gap between the final optical element and the substrate through the first liquid supply nozzle. More specifically, when a first threshold of the circularity of the colony is C1, and a second predetermined threshold is C2, a colony satisfying C2\u2266C is determined as the undifferentiated colony, a colony satisfying C1\u2266C<C2 is determined as an undefined colony, and a colony satisfying C<C1 is determined as the differentiated colony.