A zigzag sewing machine is provided. and a heat treatment time necessary for introducing oxygen up to a solid solution limit concentration in the silicon semiconductor substrate as a whole body; and a second step of holding the silicon semiconductor substrate at a specified temperature in a range from 1,000\xb0 C. The second transmission unit data can be transmitted through the same tunnel as the first transmission unit data. The image data processing unit includes a data storage unit for storing received image data and the like, a CPU for editing image data based on an input of output format information, and a printer for outputting the edited image data.