A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. A character at an intended point is displayed in an enlarged form according to a designated magnification rate on a screen of a display unit, and an intended area is newly opened according to the intended point and displayed in an enlarged form. Connecting services to the host through a stateful firewall allows dynamic integration, and passes only traffic of interest to the service.