Disclose is a method, program product and apparatus for optimizing numerical aperture and sigma of a lithographic system based on the target layout. A digital image is outputted by an optical sensor and includes M pixels. During system initialization, a broadcast aperture is allocated to the bridge in address space based on an aperture size value set using a system configuration utility and stored in system configuration memory. The invention also includes capacitor constructions, and methods of forming capacitor constructions. The raster arrangement is configured to be used in a microlithography illumination system. To that end, the composition has a plurality of components, a subset of which has substantially similar rates of evaporation for an interval of time.