In an exemplary embodiment, a window sill comprises a structural base having a first side and a second side, a fenestration cap attached to the structural base, a window frame mounted on the fenestration cap and finish elements applied to the structural base and adjacent to the fenestration cap. The silicon-containing film ensures effective pattern formation, effective transfer of a photoresist pattern, and accurate processing of a substrate. A block of the same ferromagnetic material is sized to loosely fit in the gap while being spaced apart from each of the opposing surfaces defining the gap. The fabric component may be mixed with another biomass fuel component before introduction into a gasifier. Second upper electrodes are also formed adjoined to the block selecting transistors and being disconnected from the first upper electrode of the memory cells.