The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. Suitable additives include metal overbases and metal dispersions and the metals suitable include, but are not necessarily limited to, magnesium, calcium, barium, strontium, aluminum, boron, zinc, silicon, cerium, titanium, zirconium, chromium, molybdenum, tungsten, andor platinum, overbases and dispersions. The optical fiber and the optical semiconductor element are mounted on the upper surface. The method also includes storing information regarding administrator-level access privileges of an administrator group, and permitting access to transmit the notification by the user based on the user’s access privileges, the at least one notification, and the at least one recipient.