Systems, apparatus, methods, and articles of manufacture that provide for outputting and utilization of risk zone information are provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The apparatus further includes a mail transmission unit configured to transmit, if a normal operation response to the operation request has not been received, an e-mail message including the operation request to the controlling apparatus. The calculations may include adding an activity yield to activity scrap and fixed resource scrap to generate a component quantity. These parameter values may be defined per channel identifier or for a group of CIDs. The method further includes rotating the inner wire assembly relative to the outer tube at speeds in excess of 50,000 RPM such that the cutting tip removes contacted tissue.