Disclosed is a photo mask used for fabricating a semiconductor device, capable of ensuring a process margin for a photo process in a pattern region where it is difficult to use an assist feature. The compounds are of the Formula I: 1. One or more services are determined from the plurality of services based at least in part upon the greenness metric for each of the plurality of services. The upper mandibular member has a tube incorporated into it, running along the lingual incisal edge of the upper teeth.