A process for making a useful cleaning product from an alkoxylate of a secondary alcohol which comprises: partially sulfating a secondary alcohol alkoxylate with sulfur trioxide in a falling film sulfation reactor at a molar ratio of sulfur trioxide to secondary alcohol alkoxylate of less than 0. The reflection surfaces, and the surfaces of the cover body or bodies towards the reflection surfaces, are adapted to one another such that between them there remains a thin gap or only point contacts exist. The hard mask layer may also have separate trench and via patterns therein that are respectively defined by at least first and second ones of the electrically insulating material layers and at least third and fourth ones of the electrically insulating material layers. Finally, the invention relates to a method for the qualitative and quantitative measurement of the charging of a wafer during processing of the wafer. The impedance of the dipole is based on the width of these apertures and the size of the cable conductor. A plurality of leads extends from the lead frame over the conductive traces proximate the semiconductor die periphery and directly attaches to and makes electrical contact with the conductive traces in a LOC arrangement.