Coatings are provided to give polymeric structures a top coat that improves the gas barrier properties of the structure while enhancing the water resistance of the top coating and while improving the adhesion of the top coat to an underlying layer of the structure. At least one exposure process, a developing process, and a baking process are performed to a photo-sensitive material layer formed a substrate to fabricate a photo spacer, wherein the at least one exposure process includes a back side exposure process. exhibits improved document offset properties and improved heat cohesion. The currently committed instructions may be determined to be the machine instructions that are already scheduled as well as the machine instructions that are descendent from already scheduled machine instructions.