The present invention provides a photoreduction method for metal complex ions by which strict controllability is not required in the control of its exposure amount, and a size of the metallic structure to be produced can be controlled, besides there is no fear of reducing spatial resolution of the size of the metallic structure to be produced. The lavatory monument assembly includes an enclosure that defines a first lavatory interior and includes at least a front wall and first and second side walls extending rearwardly from the front wall. When an under pressure is formed in the suction port, the skin tissue is drawn by vacuum into the anterior compartment and irradiated by the ultrasound wave to form a focal spot optionally and preferably at a distance of from about 0. The dummy modifying unit modifies dummy wiring in the partial area where the overpolishing occurs extracted by the overpolished area extracting unit andor dummy wiring in surrounding areas of the partial area to reduce the number of partial areas where the overpolishing occurs. The pitch of the helix is in the range of 0.