Embodiments of the invention are directed towards improving on-wafer process performance and processing at increased processing fluidwafer temperature while maintaining good process performance. Light from the fibers is focused on a photoresist layer during wafer manufacture and a pattern of dots is etched into the wafer to represent the character. The second amplification block is configured to be driven by an internal voltage, to differentially amplify the first and second differential signals, and to generate an output signal. A first flat surface is designed to fit snugly against the flat surface on the ridge of the container, even at the extreme range of small containerlarge cap.