A substrate processing apparatus and a substrate processing method is provided for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate such as a semiconductor wafer or a liquid crystal substrate. Each bit line includes a first bit line portion, a second bit line portion, and a switching device extending between the first and second bit line portions to selectively connect the first and second bit line portions together. A compressible resilient elastomer member is disposed within the interior aperture of the housing. In one embodiment, the site comprises a collection of software objects that can be manipulated by a set of users having assigned privileges defined by permissions associated with each software object in the collection of software objects. The pedestal is rotatably movable between a hold position in which the pedestal extends from the suspension to a location proximate to the frame and a retracted position in which the pedestal is further from the frame than when in the hold position.