A method of forming an insulating layer and a method of manufacturing a semiconductor device using insulating layer are disclosed. In the present invention, which relates to the method for scheduling the uplink, a primary user equipment for a user equipment group is configured, and information according to a random access procedure that is performed by the primary user equipment is shared by means of other user equipments in the user equipment group. Alternatively, the method employs a composition comprising trisphosphine and at least one amine or corresponding ammonium derivative.