A method for correction of defects in lithography masks includes determining the existence of mask defects on an original mask, and identifying a stitchable zone around each of the mask defects found on the original mask. The method includes receiving statistics from client devices that are coupled to the remote server. A communication and control protocol to operate the system safely and efficiently, use of forward and reverse telemetry channels having a limited bandwidth capacity, and minimizing the adverse consequences caused by errors in data transmission and intermittent loss of power to the implants.