Apparatus and methods that minimize surface defect development in silicon wafers during thermal processing at relatively high temperatures at which silicon wafers are annealed and at less extreme temperature, or for other purposes. The catalyst is preferably loaded with other metal ions such as lead, nickel, thallium or their mixture for increased yield. Charge storage layers are formed the channel region. ; an output rectifyingfiltering unit electrically connected to the isolated power inverter to generate an output D. The compounds bind to chemokine receptors, including CXCR4 and CCR5, and demonstrate protective effects against infection of target cells by a human immunodeficiency virus. Also disclosed is an apparatus for practicing the method, which may include a shielding device disposed between the furnace walls and the object body.