Charged-particle-beam projection-exposure apparatus and methods are disclosed that achieve improved pattern-transfer accuracy, especially when using a segmented stencil reticle. The insulation region is formed by a first mirror region of polycrystalline silicon, a second mirror region of metal material, and a channel-stopper region of dielectric material, surrounding the first and second mirror regions. The cleaning mixture may further include de-ionized water. Other embodiments may be disclosed and claimed. The first and second devices can then combine the first and second random numbers to establish the link key for encrypting and decrypting messages between the first and second device. The invention further provides a location data processing system.