An apparatus includes at least one Rogowski coil and a processor. A cleaning head has a plurality of cleaning units and a drying unit. 995 wt % to 16 wt % per 100 wt % by weight of the enamel.
Algorithmically generated prior art
An apparatus includes at least one Rogowski coil and a processor. A cleaning head has a plurality of cleaning units and a drying unit. 995 wt % to 16 wt % per 100 wt % by weight of the enamel.